Samsung’s new Galaxy S might be an iPhoneX Notch clone, judging by the new patent filed by the South Korean tech giant.
The controversial notch, mocked by Samsung on several occasions (including in the company’s official commercial) might adorn the phonemaker’s future model.
It comes after the patent application, submitted on March 30, shows a phone design concept with Apple’s iPhone X signature notch on the top of the screen.
Other similarities include the absence of the bezels and the fingerprint scanner.The rectangular cutout on the front screen, AKA the notch, was first introduced by Essential Phone and the iPhone X in 2017. Ever since then, its design choice has stirred up divided opinions, with many worrying the notch will get in the way of using the phone or viewing the screen.
Still, the feature has achieved huge success and became the latest trend among Android phones. Some of the biggest players in the market, such as Asus, Huawei, and OnePlus have already implemented or announced the notch, with Samsung seeming like the final holdout.
Finally, it looks like folks from Samsung have given up and are working on the notch themselves. This doesn’t mean their new design is a complete iPhoneX clone, however. Plus, the illustrated design concept is nothing more than that – meaning the actual product from Samsung might not looking anything like it.
Unlike the iPhone X, the proposed design features a dual-lens rear camera and curved panels on the front. There is also a 3.5 mm headphone jack.
Other designs concepts in Samsung’s patent applications are trying to maximize the screen’s display by completely removing the notch.
It is still uncertain whether Samsung will go ahead and give the notch a green light. One is for sure, though – the designers are contemplating implementing the iPhone X’s hallmark feature. By doing this, Samsung will not only hop on the trend’s board late but will also directly contradict themselves.